The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9701795 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 11, 2017

Filed:

May. 27, 2009
Applicants:

Norbert Auner, Glashuetten, DE;

Christian Bauch, Bitterfeld-Wolfen, DE;

Gerd Lippold, Leipzig, DE;

Rumen Deltschew, Leipzig, DE;

Seyed-javad Mohsseni-ala, Bitterfeld-Wolfen, DE;

Inventors:

Norbert Auner, Glashuetten, DE;

Christian Bauch, Bitterfeld-Wolfen, DE;

Gerd Lippold, Leipzig, DE;

Rumen Deltschew, Leipzig, DE;

Seyed-Javad Mohsseni-Ala, Bitterfeld-Wolfen, DE;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 33/107 (2006.01); C08G 77/60 (2006.01); B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
C08G 77/60 (2013.01); B01J 19/088 (2013.01); B01J 2219/0871 (2013.01); B01J 2219/0883 (2013.01); B01J 2219/0894 (2013.01);
Abstract

The present invention relates to a halogenated polysilane as a pure compound or a mixture of compounds each having at least one direct Si—Si bond, whose substituents consist exclusively of halogen or of halogen and hydrogen and in the composition of which the atomic ratio of substituent to silicon is at least 1:1.


Find Patent Forward Citations

Auner, Norbert. (2017). Halogenated polysilane and plasma-chemical process for producing the same (U.S. Patent No. 9701795). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9701795

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…