The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Dec. 21, 2016
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Ming-Tzung Wu, Mailiao Township, TW;

Te-Yi Chang, Taoyuan, TW;

Yao-Jheng Huang, Taipei, TW;

Yun-Yu Lai, Qionglin Township, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/28 (2006.01); H01L 23/29 (2006.01); H01L 51/52 (2006.01); C08F 283/12 (2006.01); C08L 51/08 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/5253 (2013.01); C08F 283/12 (2013.01); C08L 51/085 (2013.01); H01L 51/004 (2013.01); H01L 51/0043 (2013.01); C08L 2203/16 (2013.01); C08L 2203/206 (2013.01); H01L 51/0096 (2013.01); H01L 2251/301 (2013.01); H01L 2251/303 (2013.01); H01L 2251/558 (2013.01);
Abstract

A copolymer according to the present disclosure is provided, which includes 30 to 80 mol % of a repeating unit represented by formula (I), 5 to 25 mol % of a repeating unit represented by formula (II), and 5 to 30 mol % of a repeating unit represented by formula (III): wherein Ris C6-C13 aryl group, C7-C13 aralkyl group, C6-C8 halogenated aryl group or C7-C8 aryloxyalkyl group; Ris C3-C16 alkyl group or C3-C6 alkoxy substituted alkyl group; Ris a single bond or C1-C3 alkylene group, Rand Rare independently C1-C3 alkoxy group, Ris polysiloxane with methyl and phenyl groups; and R, Rand Rare independently hydrogen or methyl. In addition, a resin composition, a packaging film and a package structure including the same are provided.


Find Patent Forward Citations

Loading…