The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Sep. 13, 2011
Applicants:

Hiroyuki Tanaka, Osaka, JP;

Takao Manabe, Osaka, JP;

Inventors:

Hiroyuki Tanaka, Osaka, JP;

Takao Manabe, Osaka, JP;

Assignee:

KANEKA CORPORATION, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/56 (2010.01); C07F 7/21 (2006.01); C08G 77/50 (2006.01); C08G 77/00 (2006.01); C08K 5/3492 (2006.01); C08K 5/56 (2006.01); C08G 77/04 (2006.01); C08G 77/12 (2006.01); C08G 77/20 (2006.01);
U.S. Cl.
CPC ...
H01L 33/56 (2013.01); C07F 7/21 (2013.01); C08G 77/50 (2013.01); C08G 77/80 (2013.01); C08K 5/34924 (2013.01); C08K 5/56 (2013.01); C08G 77/045 (2013.01); C08G 77/12 (2013.01); C08G 77/20 (2013.01); C08K 2201/008 (2013.01);
Abstract

An object of the present invention is to provide a polyhedral polysiloxane composition that has high heat resistance and high light resistance, is excellent in gas-barrier properties and thermal shock resistance, and exhibits good handleability when used to encapsulate an optical semiconductor device. The polyhedral polysiloxane composition of the present invention is characterized by including a modified polyhedral polysiloxane which is obtained by hydrosilylation of an alkenyl group-containing polyhedral polysiloxane compound (a) and a hydrosilyl group-containing compound (b) and has a structure derived from an organic silicon compound (a') having one alkenyl group per molecule.


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