The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Sep. 30, 2014
Applicant:

Sumitomo Electric Industries, Ltd., Osaka-shi, JP;

Inventor:

Noriyuki Hirakata, Osaka, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 31/0312 (2006.01); H01L 29/06 (2006.01); H01L 29/739 (2006.01); H01L 29/16 (2006.01); H01L 21/04 (2006.01); H01L 29/417 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/04 (2006.01); H01L 29/10 (2006.01); H01L 29/45 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0696 (2013.01); H01L 21/046 (2013.01); H01L 21/0485 (2013.01); H01L 29/045 (2013.01); H01L 29/1095 (2013.01); H01L 29/1608 (2013.01); H01L 29/41741 (2013.01); H01L 29/45 (2013.01); H01L 29/66068 (2013.01); H01L 29/7395 (2013.01); H01L 29/7802 (2013.01);
Abstract

A MOSFET includes: a SiC layer including one main surface and provided with a plurality of contact regions; and a plurality of source electrodes formed in contact with the contact regions. In the MOSFET, in a plan view of the one main surface, a plurality of cells including the contact regions and the source electrodes are formed adjacent to one another, each of the plurality of cells having an outer circumferential shape that is a shape of hexagon including a long axis. According to the MOSFET, a contact resistance between each contact region and each source electrode can be further reduced, thereby attaining a more improved electrical property.


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