The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Nov. 25, 2014
Applicant:

The Board of Trustees of the Leland Stanford Junior University, Palo Alto, CA (US);

Inventors:

Garrett J. Hayes, Livermore, CA (US);

Bruce M. Clemens, Stanford, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); H01L 21/268 (2006.01); H01L 31/18 (2006.01); H01L 33/00 (2010.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7813 (2013.01); H01L 21/268 (2013.01); H01L 21/6835 (2013.01); H01L 21/7806 (2013.01); H01L 31/1848 (2013.01); H01L 31/1892 (2013.01); H01L 31/1896 (2013.01); H01L 33/0079 (2013.01); H01L 2221/68363 (2013.01); H01L 2221/68381 (2013.01); Y02E 10/544 (2013.01);
Abstract

This work provides a new approach for epitaxial liftoff. Instead of using a sacrificial layer that is selectively etched chemically, the sacrificial layer selectively absorbs light that is not absorbed by other parts of the structure. Under sufficiently intense illumination with such light, the sacrificial layer is mechanically weakened, melted and/or destroyed, thereby enabling epitaxial liftoff. The perimeter of the semiconductor region to be released is defined (partially or completely) by lateral patterning, and the part to be released is also adhered to a support member prior to laser irradiation. The end result is a semiconductor region removed from its substrate and adhered to the support member.


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