The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Jun. 09, 2011
Applicants:

Seiyo Nakashima, Toyama, JP;

Yuichi Matsuda, Toyama, JP;

Takashi Nogami, Toyama, JP;

Shinobu Sugiura, Toyama, JP;

Tomoyuki Yamada, Toyama, JP;

Inventors:

Seiyo Nakashima, Toyama, JP;

Yuichi Matsuda, Toyama, JP;

Takashi Nogami, Toyama, JP;

Shinobu Sugiura, Toyama, JP;

Tomoyuki Yamada, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67757 (2013.01); H01L 21/67017 (2013.01);
Abstract

A substrate processing apparatus includes a holder configured to hold a substrate and carry the substrate into a process chamber, a waiting station located outside the process chamber in which the holder waits prior to carrying the substrate into the process chamber, a circulation path configured to circulate a gas throughout the waiting station, and an exhaust path formed in the circulation path and configured to exhaust the gas from the waiting station.


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