The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Jun. 07, 2015
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Remi Palandri, Cupertino, CA (US);

Domenico P. Porcino, Novato, CA (US);

Jacques P. Gasselin de Richebourg, Sunnyvale, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/00 (2006.01); G06T 11/00 (2006.01); G06T 15/04 (2011.01); G06T 17/10 (2006.01); G06T 19/00 (2011.01);
U.S. Cl.
CPC ...
G06T 11/001 (2013.01); G06T 15/04 (2013.01); G06T 17/10 (2013.01); G06T 19/00 (2013.01); G06T 2219/021 (2013.01);
Abstract

Techniques are disclosed for generating and using a conformal or UV mapping between an object's 3D representation (e.g., a polygonal mesh model) and a corresponding 2D representation (e.g., texture memory). More particularly, techniques disclosed herein generate a conformal mapping that allows the rapid identification of disparate locations in texture memory (e.g., those that span a seam) that are spatially similar at the corresponding 3D locations. The ability to perform 2D-to-3D-to-2D mappings quickly, grants the ability to filter across a conformal map's seams—an action that has previously been avoided due to its high computational cost.


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