Manufacturing method of liquid crystal display

Abstract

A method for manufacturing a liquid crystal display includes: forming a first passivation layer and an organic layer, forming an edge of an inclined portion of the organic layer by partially removing the organic layer at a location where a first drain contact hole that exposes a drain electrode of a thin film transistor is formed, forming a second passivation layer including a third drain contact hole exposing the drain electrode, a first electrode including a second drain contact hole exposing the drain electrode, and the first drain contact hole through an etching process using one etching mask, and forming a second electrode on the second passivation layer. The first drain contact hole, the second drain contact hole, and the third drain contact hole overlap with each other, and a size of the second drain contact hole is greater than a size of the third drain contact hole.