The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Dec. 04, 2014
Applicant:

Flowserve Management Company, Irving, TX (US);

Inventor:

John Davis, Temecula, CA (US);

Assignee:

Flowserve Management Company, Irving, TX (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F16J 15/34 (2006.01); C23C 16/32 (2006.01); C23C 16/06 (2006.01);
U.S. Cl.
CPC ...
F16J 15/3496 (2013.01); C23C 16/06 (2013.01); C23C 16/32 (2013.01); F16J 15/3412 (2013.01); F16J 15/34 (2013.01); F16J 15/3424 (2013.01);
Abstract

An improved mechanical face seal is provided which includes a pair of relatively rotatable seal rings having opposing seal faces. At least one of the seal faces and preferably the silicon carbide seal ring includes a tantalum coating over the seal face. The coating is formed such that the exposed seal face surface is formed of tantalum with a preferred thickness, and the substrate is the silicon carbide seal ring material. Between the silicon carbide substrate and exposed tantalum coating layer, an intermediate transformation layer of tantalum carbide is formed to enhance bonding of the substrate and coating layer. Preferably, the tantalum carbide layer is formed during the coating process wherein the tantalum is applied by chemical vapor deposition and the tantalum reacts with the silicon carbide to form the tantalum carbide at the interface between the tantalum coating layer and the seal ring substrate.


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