The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Jun. 30, 2014
Applicant:
Yanmar Co., Ltd., Osaka-shi, Osaka, JP;
Inventors:
Assignee:
Yanmar Co., Ltd., Osaka-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01N 3/00 (2006.01); F01N 9/00 (2006.01); F01N 3/023 (2006.01); F01N 3/10 (2006.01); B01D 53/90 (2006.01); B01D 53/94 (2006.01); F01N 3/035 (2006.01); F01N 3/025 (2006.01); F02D 41/02 (2006.01); F02D 41/40 (2006.01);
U.S. Cl.
CPC ...
F01N 9/002 (2013.01); B01D 53/90 (2013.01); B01D 53/944 (2013.01); B01D 53/9477 (2013.01); B01D 53/9495 (2013.01); F01N 3/023 (2013.01); F01N 3/0253 (2013.01); F01N 3/035 (2013.01); F01N 3/103 (2013.01); F01N 3/106 (2013.01); F02D 41/029 (2013.01); F02D 41/405 (2013.01); B01D 2251/208 (2013.01); B01D 2258/012 (2013.01); F01N 3/025 (2013.01); F01N 2240/36 (2013.01); F01N 2250/02 (2013.01); F01N 2430/085 (2013.01); F01N 2900/1606 (2013.01); F02D 41/025 (2013.01); F02D 41/0245 (2013.01); F02D 41/402 (2013.01); F02D 2200/0812 (2013.01); Y02T 10/44 (2013.01);
Abstract
An exhaust gas purifying apparatus includes an oxidative catalyst and a filter that are disposed in an exhaust gas path of an engine; a fuel injecting device that injects fuel according to a fuel injection pattern; and a control device that estimates a deposition amount of a particulate matter and sets the fuel injection pattern. When the fuel injection pattern including post-injection is set to recover the filter, the fuel injection pattern is set such that a post-injection amount is reduced as the deposition amount increases.