The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Sep. 30, 2013
Applicant:
Hitachi Kokusai Electric Inc., Tokyo, JP;
Inventors:
Makoto Hirano, Toyama, JP;
Akinari Hayashi, Toyama, JP;
Assignee:
HITACHI KOKUSAI ELECTRIC INC., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); C23C 16/44 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4408 (2013.01); H01L 21/67017 (2013.01); H01L 21/67393 (2013.01); H01L 21/67757 (2013.01); H01L 21/67769 (2013.01); H01L 21/67772 (2013.01); Y10T 137/8593 (2015.04);
Abstract
A substrate processing apparatus includes a processing vessel configured to process a substrate; a first purging part configured to perform a first purge to supply inert gas at a first flow rate into a substrate container accommodating the substrate; and a second purging part configured to perform a second purge to supply inert gas at a second flow rate into the substrate container, the second flow rate being lower than the first flow rate.