The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Jul. 04, 2014
Bioneer Corporation, Daejeon, KR;
Joo Sung Yang, Seoul, KR;
Woo Seok Kim, Daejeon, KR;
Soon Ja Choi, Daejeon, KR;
Han Oh Park, Daejeon, KR;
BIONEER CORPORATION, Daejeon, KR;
Abstract
The present invention relates to a dengue virus-specific siRNA, a double-stranded oligo RNA structure comprising the siRNA, and a composition for inhibiting dengue virus replication, which comprises the same, in which the double-stranded oligo RNA structure comprises a hydrophilic compound and hydrophobic compound conjugated to both ends of the double-stranded RNA (siRNA) by a single covalent bond or a linker-mediated covalent bond so that they will be efficiently delivered into cells, and can be converted into nanoparticles by hydrophobic interactions between the double-stranded oligo RNA structures in an aqueous solution. The siRNA included in the double-stranded oligo RNA structure acts specifically on all dengue virus serotypes. The present invention also relates to a method for preparing the double-stranded oligo RNA structure, and a pharmaceutical composition for preventing or treating dengue virus infection, which comprises the double-stranded oligo RNA structure.