The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Aug. 07, 2013
Korea Institute of Industrial Technology, Chungcheongam-do, KR;
Ju Dong Lee, Busan, KR;
Kyeong Chan Kang, Daegu, KR;
Joung Ha Kim, Chungcheongnam-do, KR;
Jae Il Lim, Daegu, KR;
Korea Institute Of Industrial Technology, Chungcheongnam-Do, KR;
Abstract
The present invention provides a method for preparing gas hydrates by reacting a plurality of guest gases with water, wherein a first guest gas has a higher water solubility than that of a second guest gas, and the pressure of the gas hydrate formation condition of the second guest gas is lower than the pressure of the gas hydrate formation condition of the first guest gas. While the traditional gas hydrate production method, wherein a single guest gas is reacted with water, is unsatisfactory in terms of cost effectiveness and productivity, the present invention provides improved production yield of gas hydrates and enables an easy production of gas hydrates at lower pressure.