The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
May. 16, 2014
Applicant:
Fujifilm Electronic Materials U.s.a., Inc., North Kingstown, RI (US);
Inventors:
Sanjay Malik, Attleboro, MA (US);
William A. Reinerth, Riverside, RI (US);
Binod B. De, Attleboro, MA (US);
Ahmad A. Naiini, East Greenwich, RI (US);
Assignee:
Fujifilm Electronic Materials U.S.A., Inc., N. Kingstown, RI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/10 (2006.01); C09D 179/08 (2006.01); C08K 5/1535 (2006.01); C08K 5/101 (2006.01); C08K 5/06 (2006.01); C08K 5/07 (2006.01);
U.S. Cl.
CPC ...
C08G 73/1071 (2013.01); C08G 73/1014 (2013.01); C08G 73/1032 (2013.01); C08G 73/1039 (2013.01); C08G 73/1067 (2013.01); C08K 5/06 (2013.01); C08K 5/07 (2013.01); C08K 5/101 (2013.01); C08K 5/1535 (2013.01); C09D 179/08 (2013.01);
Abstract
This disclosure relates to a polymer that includes a first repeat unit and at least one end-cap group at one end of the polymer. The first repeat unit includes at least one imide moiety and at least one indane-containing moiety. The end-cap group is capable of undergoing a cycloreversion reaction. This disclosure also relates to a thermosetting composition containing the above polymer.