The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Apr. 20, 2016
Applicants:
SK Innovation Co., Ltd., Seoul, KR;
SK Global Chemical Co., Ltd., Seoul, KR;
Inventors:
Kwang Kuk Lee, Daejeon, KR;
Jin Su Ham, Daejeon, KR;
Sun Joo Kim, Daejeon, KR;
Hye Ryoung Lee, Daejeon, KR;
Min Ho Jung, Daejeon, KR;
Assignees:
SK Innovation Co., Ltd., Seoul, KR;
SK Global Chemical Co., Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 65/38 (2006.01); C07C 323/18 (2006.01); C07C 39/17 (2006.01); C07C 39/42 (2006.01); C07C 43/225 (2006.01); C07C 43/23 (2006.01); C09D 171/00 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
C08G 65/38 (2013.01); C07C 39/17 (2013.01); C07C 39/42 (2013.01); C07C 43/225 (2013.01); C07C 43/23 (2013.01); C07C 323/18 (2013.01); C09D 171/00 (2013.01); G03F 7/094 (2013.01); C07C 2103/18 (2013.01); C07C 2103/40 (2013.01);
Abstract
Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below: