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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9695279 B1

PDFFull Text
Date of Patent:
Jul. 04, 2017

Filed:

Apr. 20, 2016

Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition

Applicants:

SK Innovation Co., Ltd., Seoul, KR;

SK Global Chemical Co., Ltd., Seoul, KR;

Inventors:

Kwang Kuk Lee, Daejeon, KR;

Jin Su Ham, Daejeon, KR;

Sun Joo Kim, Daejeon, KR;

Hye Ryoung Lee, Daejeon, KR;

Min Ho Jung, Daejeon, KR;

Assignees:

SK Innovation Co., Ltd., Seoul, KR;

SK Global Chemical Co., Ltd., Seoul, KR;

Attorney:

The Webb Law Firm

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
C08G 65/38 (2006.01); C07C 323/18 (2006.01); C07C 39/17 (2006.01); C07C 39/42 (2006.01); C07C 43/225 (2006.01); C07C 43/23 (2006.01); C09D 171/00 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
C08G 65/38 (2013.01); C07C 39/17 (2013.01); C07C 39/42 (2013.01); C07C 43/225 (2013.01); C07C 43/23 (2013.01); C07C 323/18 (2013.01); C09D 171/00 (2013.01); G03F 7/094 (2013.01); C07C 2103/18 (2013.01); C07C 2103/40 (2013.01);
Abstract

Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:

Find Patent Forward Citations

Lee, Kwang. (2017). Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition (U.S. Patent No. 9695279). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9695279

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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