The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Aug. 16, 2011
Applicants:

Anders Erik Martin Hjelmberg, Vaxjo, SE;

Ali Mustapha Tabikh, Vaxjo, SE;

Inventors:
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 50/00 (2006.01); B01D 53/34 (2006.01); B01D 45/08 (2006.01); B01D 46/10 (2006.01); B01D 53/86 (2006.01); B01F 3/04 (2006.01); B01F 5/04 (2006.01); B01F 5/06 (2006.01); B21D 31/04 (2006.01); F01N 3/20 (2006.01); F01N 3/28 (2006.01); B03C 3/36 (2006.01);
U.S. Cl.
CPC ...
B01D 53/34 (2013.01); B01D 45/08 (2013.01); B01D 46/10 (2013.01); B01D 50/002 (2013.01); B01D 53/86 (2013.01); B01F 3/04049 (2013.01); B01F 5/0451 (2013.01); B01F 5/0693 (2013.01); B03C 3/363 (2013.01); B21D 31/04 (2013.01); F01N 3/2066 (2013.01); F01N 3/2892 (2013.01); F01N 2240/20 (2013.01); F01N 2330/12 (2013.01); F01N 2330/38 (2013.01); F01N 2570/14 (2013.01); F01N 2610/02 (2013.01); Y02T 10/24 (2013.01);
Abstract

The present disclosure deals with a gas cleaning system () for cleaning process flue gas. The gas cleaning system () comprises a reactor inlet duct () having a longitudinal axis and a reactor duct () fluidly connected perpendicularly to the reactor inlet duct and positioned downstream from the reactor inlet duct. The reactor duct likewise has a longitudinal axis. Within the reactor duct is a gas cleaning device (), such as a catalytic reactor, and a gas flow rectifier () for rectifying flue gas flow from the reactor inlet duct () into the reactor duct (). The gas flow rectifier is arranged in the reactor duct upstream of the gas cleaning device (), wherein the gas flow rectifier () comprises at least one expanded screen ().


Find Patent Forward Citations

Loading…