The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2017
Filed:
Apr. 14, 2014
Xerox Corporation, Norwalk, CT (US);
Andres Quiroz Hernandez, Rochester, NY (US);
Yasmine Charif, Rochester, NY (US);
Julien Bourdaillet, Rochester, NY (US);
Xerox Corporation, Norwalk, CT (US);
Abstract
The present invention generally relates to systems and methods for visual process analysis. The disclosed techniques can include: obtaining a theoretical and an empirical process model, generating a theoretical process layout corresponding to the theoretical process model, where the theoretical process layout is generated using a layout algorithm, generating an empirical process layout corresponding to the empirical process model, where the empirical process layout is generated using the layout algorithm, superposing the empirical process layout onto the theoretical process layout, such that a superposition layout is generated, annotating the superposition layout based on ugliness indicators, such that an annotated superposition layout is generated, and causing the annotated superposition layout to be displayed.