The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2017
Filed:
Jun. 29, 2015
Applicant:
National Cheng Kung University, Tainan, TW;
Inventors:
Yung-Chun Lee, Tainan, TW;
Chun-Ying Wu, Taichung, TW;
Heng Hsieh, Tainan, TW;
Yi-Ta Hsieh, Hsinchu, TW;
Jhih-Nan Yan, Pingtung County, TW;
Assignee:
NATIONAL CHENG KUNG UNIVERSITY, Tainan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/38 (2012.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01);
Abstract
A method for manufacturing a photomask is provided. The method includes providing a flexible substrate, forming a plurality of microstructures on the flexible substrate, coating the flexible substrate with a shading material to form a shading layer on the substrate, and solidifying the shading layer which is a single layer.