The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2017

Filed:

May. 25, 2016
Applicants:

Innocom Technology(shenzhen) Co., Ltd., Longhua Town, Bao An District, Shenzhen, Guangdong Province, CN;

Innolux Corporation, Miao-Li County, TW;

Inventors:

Chun-Ming Wang, Miao-Li County, TW;

Hsixg-Ju Sung, Miao-Li County, TW;

Te-Yu Lee, Miao-Li County, TW;

Assignees:

INNOCOM TECHNOLOGY (SHENZHEN) CO., LTD., Longhua Town, Shenzhen, CN;

INNOLUX CORPORATION, Miao-Li County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/133 (2006.01); G02F 1/1339 (2006.01); G02F 1/1341 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1339 (2013.01); G02F 1/1341 (2013.01); G02F 1/13306 (2013.01); G02F 1/133345 (2013.01); G02F 2001/133357 (2013.01); G02F 2202/02 (2013.01);
Abstract

A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate, including an opening and two sidewalls, wherein the opening is located between the two sidewalls and corresponding to the peripheral area. A passivation layer is disposed between the seal and the first substrate, and wherein a portion of the seal is disposed between the two sidewalls of the patterned planarization layer.


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