The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
Dec. 19, 2012
Applicant:
Canon Anelva Corporation, Kawasaki-shi, JP;
Inventor:
Yukito Nakagawa, Kawasaki, JP;
Assignee:
Canon Anelva Corporation, Kawasaki-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/09 (2006.01); C23F 4/00 (2006.01); H01F 41/34 (2006.01); H01J 37/34 (2006.01); H05H 1/46 (2006.01); H01L 43/12 (2006.01);
U.S. Cl.
CPC ...
H01J 37/09 (2013.01); C23F 4/00 (2013.01); H01F 41/34 (2013.01); H01J 37/321 (2013.01); H01J 37/32357 (2013.01); H01J 37/32651 (2013.01); H01J 37/3411 (2013.01); H01L 43/12 (2013.01); H05H 1/46 (2013.01); H05H 2001/4667 (2013.01);
Abstract
In order to easily exchange a depleted dielectric member in a substrate processing apparatus, a faraday shield provided opposite to an antenna across a component member made of a dielectric, a first dielectric member provided opposite to the antenna across the component member and the faraday shield, and a second dielectric member provided opposite to the antenna across the component member, the faraday shield, and the first dielectric member are provided, and the second dielectric member is placed on a protrusion part formed on a vacuum container in the substrate processing apparatus.