The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
Aug. 13, 2015
Applicant:
Korea Institute of Science and Technology, Seoul, KR;
Inventors:
Won Kook Choi, Seoul, KR;
Dong Hee Park, Seoul, KR;
Chang Hwan Wie, Seoul, KR;
Do Kyung Hwang, Seoul, KR;
Assignee:
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/115 (2015.01); G02B 1/118 (2015.01);
U.S. Cl.
CPC ...
G02B 1/115 (2013.01); G02B 1/118 (2013.01); Y10T 428/24413 (2015.01);
Abstract
Provided are an anti-reflection nano-coating structure and a method of manufacturing the same. The anti-reflection nano-coating structure has low dependency on incident light. The anti-reflection nano-coating structure has a normal-align nano-structure on the entire surface of the substrate regardless of curvature of the substrate by controlling a ratio of reactive gas during sputtering.