The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2017

Filed:

Mar. 19, 2014
Applicant:

Sagem Defense Securite, Boulogne-Billancourt, FR;

Inventors:

Francois Dufresne De Virel, Boulogne-Billancourt, FR;

Marc Bousquet, Boulogne-Billancourt, FR;

Assignee:

SAGEM DEFENSE SECURITE, Boulogne-Billancourt, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/36 (2006.01); H04N 5/33 (2006.01); G01J 1/04 (2006.01); F41G 3/14 (2006.01); G01S 3/781 (2006.01); G01S 3/784 (2006.01);
U.S. Cl.
CPC ...
G01J 3/36 (2013.01); F41G 3/147 (2013.01); G01J 1/0407 (2013.01); G01S 3/781 (2013.01); G01S 3/784 (2013.01); H04N 5/33 (2013.01);
Abstract

The invention relates to a system for detection and infrared imaging by spectral analysis in several wavelength bands comprising: —an imaging sensor comprising a plurality of elementary sensors together forming a matrix sensitive surface; —an imaging optic adapted for forming on the sensitive surface of the imaging sensor, a first image of the scene to be analyzed in a first wavelength band, and at least one second image of the scene to be analyzed in a second wavelength band, characterized in that said detection and imaging system furthermore comprises an optical device consisting of a fixed optical plate adapted for shifting the first image with respect to the second image in the plane of the sensitive surface, the shift between the images being along a direction defined by a row, a column or a diagonal of elementary sensors, the shift distance being equal to the spacing of the elementary sensors of the matrix sensitive surface along this direction or to a multiple of this spacing.


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