The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2017

Filed:

May. 24, 2016
Applicant:

Seagate Technology Llc, Cupertino, CA (US);

Inventors:

Michael R. Feldbaum, San Jose, CA (US);

Koichi Wago, Sunnyvale, CA (US);

Gennady Gauzner, San Jose, CA (US);

Kim Y. Lee, Fremont, CA (US);

David S. Kuo, Palo Alto, CA (US);

Assignee:

Seagate Technology LLC, Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23F 1/00 (2006.01); B29C 33/38 (2006.01); G03F 7/00 (2006.01); B29D 17/00 (2006.01); G11B 5/855 (2006.01); G03F 7/20 (2006.01); G03F 7/09 (2006.01); B29K 101/00 (2006.01);
U.S. Cl.
CPC ...
C23F 1/00 (2013.01); B29C 33/3842 (2013.01); B29D 17/00 (2013.01); G03F 7/0017 (2013.01); G03F 7/09 (2013.01); G03F 7/2002 (2013.01); G11B 5/855 (2013.01); B29K 2101/00 (2013.01); B29K 2909/00 (2013.01); Y10T 428/24802 (2015.01); Y10T 428/24851 (2015.01); Y10T 428/24917 (2015.01);
Abstract

Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.


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