The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2017

Filed:

Nov. 14, 2014
Applicant:

Nippon Shokubai Co., Ltd., Osaka-shi, Osaka, JP;

Inventors:

Makoto Nagasawa, Himeji, JP;

Jiro Sano, Himeji, JP;

Yoshiki Katada, Himeji, JP;

Kunihiko Ishizaki, Himeji, JP;

Assignee:

NIPPON SHOKUBAI CO., LTD., Osaka-shi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 20/06 (2006.01); B01J 20/26 (2006.01); C08F 2/10 (2006.01); C08F 6/00 (2006.01); B01D 53/14 (2006.01); A61L 15/24 (2006.01); A61L 15/60 (2006.01); B01J 20/30 (2006.01); C08J 3/24 (2006.01);
U.S. Cl.
CPC ...
B01J 20/261 (2013.01); A61L 15/24 (2013.01); A61L 15/60 (2013.01); B01D 53/1418 (2013.01); B01D 53/1487 (2013.01); B01D 53/1493 (2013.01); B01J 20/3021 (2013.01); B01J 20/3085 (2013.01); C08F 2/10 (2013.01); C08F 6/003 (2013.01); C08F 20/06 (2013.01); C08J 3/245 (2013.01); B01D 2252/10 (2013.01); C08J 2333/02 (2013.01);
Abstract

The purpose of the present invention is to provide a process for stably and continuously producing a water-absorbing resin, specifically, a process for stably and continuously producing a water-absorbing resin, the process including a gas absorbing step in which a gas discharged from a step of producing a water-absorbing resin is efficiently and persistently absorbed. A main point of this process for producing a water-absorbing polyacrylic acid (salt) resin further including a step of absorbing a gas discharged from a production step of the water-absorbing polyacrylic acid (salt) resin in water having a pH of 7 to 11 and a polyvalent metal ion content of 100 ppm or less or a step of absorbing the gas in water having a pH of 7 to 11, the pH of the water having been adjusted by mixing a water having an electric conductivity of 500 (μS/cm) or less at 25° C. with an alkali compound.


Find Patent Forward Citations

Loading…