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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9679991 B1

PDFFull Text
Date of Patent:
Jun. 13, 2017

Filed:

Mar. 26, 2015

Method for manufacturing semiconductor device using gate portion as etch mask

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Hwi-Chan Jun, Yongin-si, KR;

Deok-Han Bae, Anyang-si, KR;

Hyun-Seung Song, Incheon, KR;

Seung-Seok Ha, Hwaseong-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;

Attorney:

Muir Patent Law, PLLC

Primary Examiner:

Matthew Gordon

Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 29/66 (2006.01); H01L 21/768 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66795 (2013.01); H01L 21/31144 (2013.01); H01L 21/76897 (2013.01); H01L 29/6656 (2013.01); H01L 29/66545 (2013.01);
Abstract

Embodiments of the disclosure relate to a method for manufacturing a semiconductor device including a field effect transistor with improved electrical characteristics. According to embodiments of the disclosure, self-aligned contact plugs may be effectively formed using a metal hard mask portion disposed on a gate portion. In addition, a process margin of a photoresist mask for the formation of the self-aligned contact plugs may be improved by using the metal hard mask portion.

Find Patent Forward Citations

Jun, Hwi-Chan. (2017). Method for manufacturing semiconductor device using gate portion as etch mask (U.S. Patent No. 9679991). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9679991

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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