The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
Feb. 22, 2016
Shimadzu Corporation, Kyoto-shi, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto-shi, JP;
Abstract
In an ion sourcein which a repeller electrodefor forming a repelling electric field that repels ions toward an ion emission portis provided inside of an ionization chamberion focusing electrodesandare respectively arranged between an electron introduction portand a filamentand between an electron discharge portand a counter filamentAn electric field formed by applying a predetermined voltage to each of the ion focusing electrodesandintrudes into the ionization chamberthrough the electron introduction portand the electron discharge portand becomes a focusing electric field that pushes the ions in an ion optical axis C direction. Ions at positions off a central part of the ionization chamberreceive the combined force of the force of the repelling electric field and the force of the focusing electric field, and move toward the ion emission portwhile approaching the ion optical axis C. Accordingly, the amount of ions sent out from the ion emission port increases. Further, even if a charge-up phenomenon occurs, the ion trajectories less easily change, and the stability of the sensitivity can be enhanced.