The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2017

Filed:

Jan. 30, 2015
Applicant:

Massachusetts Institute of Technology, Cambridge, MA (US);

Inventors:

Larissa F. Nietner, Cambridge, MA (US);

Scott T. Nill, Fort Wayne, IN (US);

David E. Hardt, Concord, MA (US);

Muhammad A. Hawwa, Dhahran, SA;

Hussain Al-Qahtani, Dhahran, SA;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01); B29C 59/16 (2006.01); G03F 7/00 (2006.01); B29L 9/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/64 (2013.01); B29C 59/16 (2013.01); G03F 7/0002 (2013.01); B29L 2009/005 (2013.01); G01N 2021/6497 (2013.01);
Abstract

System for visualization of conformal contact. The system visualizes conformal contact between a patterned stamp and a transparent impression surface. A patterned stamp is provided that includes a fluorescent structure for contact with the impression surface. A source of UV light is provided for transmission through the transparent impression surface to interact with the fluorescent structure to generate visible light re-emitted by the fluorescent structure. An imaging system captures the visible light to form a high-contrast image of an area of conformal contact between the patterned stamp and the impression surface. The high-contrast image comprises bright and dark regions representing contact and no contact respectively.


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