The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2017

Filed:

Jun. 05, 2014
Applicant:

Korea University Research and Business Foundation, Seoul, KR;

Inventors:

Taek-Seung Kim, Seoul, KR;

Hee-Deung Park, Gyeonggi-do, KR;

Gyu-Tae Kim, Gyeonggi-do, KR;

Man-Joong Han, Seoul, KR;

Yun-Jeong Kim, Seoul, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08J 5/22 (2006.01); C08J 5/18 (2006.01); C08J 9/26 (2006.01); B01D 67/00 (2006.01);
U.S. Cl.
CPC ...
C08J 5/2218 (2013.01); C08J 5/18 (2013.01); B01D 67/009 (2013.01); B01D 2323/21 (2013.01); C08J 9/26 (2013.01); C08J 2375/04 (2013.01); C08J 2439/06 (2013.01);
Abstract

This patent is provided a method for producing a porous polymer film using vanadium oxide nanowires, and a porous polymer film obtained from the method. The method allows control of a uniform pore size and density through a simple process including the steps of: adding an ion exchanger to deionized water to perform acidification and adding a vanadate compound thereto to grow vanadium oxide nanowires by a sol-gel process; mixing the resultant solution of grown nanowires with a polymer solution to provide a mixed solution of nanowires; pouring the mixed solution of nanowires to a mold, followed by drying and curing, to form a film; and etching the resultant film with an etching solution to remove the vanadium oxide nanowires.


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