The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2017

Filed:

Jan. 16, 2015
Applicant:

Evonik Degussa Gmbh, Essen, DE;

Inventors:

Katrin Marie Dyballa, Recklinghausen, DE;

Robert Franke, Marl, DE;

Dirk Fridag, Haltern am See, DE;

Markus Priske, Mobile, AL (US);

Assignee:

Evonik Degussa GmbH, Essen, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07F 9/6574 (2006.01); C07C 45/00 (2006.01); C07C 253/00 (2006.01); B01J 31/18 (2006.01); C07C 5/02 (2006.01);
U.S. Cl.
CPC ...
C07F 9/65746 (2013.01); B01J 31/185 (2013.01); C07C 5/02 (2013.01); C07C 45/00 (2013.01); C07C 253/00 (2013.01); B01J 2231/321 (2013.01); B01J 2231/322 (2013.01); B01J 2231/645 (2013.01); C07C 2531/22 (2013.01);
Abstract

The invention relates to a process for the purification of a contaminated organophosphorus product which comprises at least one organophosphorus compound and, as contaminant, at least one chlorine compound. It is based on the object of indicating a purification method in which the chlorine content of an organophosphorus product which comprises at least one organophosphorus compound and at least one chlorine compound as contaminant, can be reduced from originally 1000 to 100 000 ppm to a total chlorine content between 10 ppm and 10 000 ppm. This is achieved by a process with the steps:


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