The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
May. 13, 2013
Basf SE, Ludwigshafen, DE;
Empa—eidgenoessische Materialpruefungs- Und Forschungsanstalt, Duebendorf, CH;
Max-planck-gesellschaft Zur Foerderung Der Wissenschaften E.v., Munich, DE;
Roman Fasel, Zurich, CH;
Pascal Ruffieux, Plasselb, CH;
Klaus Muellen, Cologne, DE;
Jinming Cai, Zurich, CH;
Xinliang Feng, Mainz, DE;
Reinhard Berger, Mainz, DE;
BASF SE, Ludwigshafen, DE;
EMPA-EIDGENOESSISCHE MATERIALPRUEFUNGS-UND FORSCHUNGSANSTALT, Duebendorf, CH;
MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFEN E.V., Munich, DE;
Abstract
The present invention relates to a graphene nanoribbon, comprising a repeating unit which comprises at least one modification, wherein the modification is selected from a heteroatomic substitution, a vacancy, a sphybridization, a Stone-Wales defect, an inverse Stone-Wales defect, a hexagonal sphybridized carbon network ring size modification, and any combination thereof.