The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
Mar. 07, 2014
Jesse A. Frantz, Landover, MD (US);
Jason D. Myers, Alexandria, VA (US);
Robel Y. Bekele, Washington, DC (US);
Jasbinder S. Sanghera, Ashburn, VA (US);
Jesse A. Frantz, Landover, MD (US);
Jason D. Myers, Alexandria, VA (US);
Robel Y. Bekele, Washington, DC (US);
Jasbinder S. Sanghera, Ashburn, VA (US);
The United States of America, as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
A method for forming a wet-etchable, sacrificial lift-off layer or layers compatible with high temperature processing, a sacrificial layer, defined as consisting of a single film of one material or multiple films of multiple materials, that can tolerate high temperatures, is deposited on a substrate, called the original substrate, by sputtering or another suitable technique (e.g. evaporation, pulsed laser deposition, wet chemistry, etc.). Intermediate steps result in a lift-off layer attached to the lift-off substrate, that allow for separating the product from the original substrate.