The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2017

Filed:

Jul. 01, 2014
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Doh-Hyoung Lee, Suwon-si, KR;

Da Hee Jeong, Geumcheon-gu, KR;

Assignee:

Samsung Display Co., Ltd., Samsung-ro, Giheung-Gu, Yongin-si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/38 (2014.01); C23C 14/04 (2006.01); B23K 26/382 (2014.01); B23K 26/362 (2014.01); H01L 51/56 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/381 (2013.01); B23K 26/362 (2013.01); B23K 26/382 (2015.10); C23C 14/042 (2013.01); H01L 51/0011 (2013.01); H01L 51/56 (2013.01); Y10T 428/24273 (2015.01);
Abstract

A manufacturing method of a metal mask including a plurality of pattern openings includes forming a first depression portion by radiating a first laser beam focused on a plane beyond a subject under processing, and then forming the plurality of pattern openings at a bottom part of the first depression portion by radiating a second laser beam focused on the bottom part of the first depression portion. Because the energy of the second laser beam is less than the first laser beam, manufacturing time of the mask is reduced while the sidewalls of the pattern opening are smooth and may be inclined, to allow for a better deposition of organic emission material onto a large display.


Find Patent Forward Citations

Loading…