The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
Jun. 27, 2013
Instytut Wysokich Ciśnień Polskiej Akademii Nauk, Warsaw, PL;
Witold Łojkowski, Warsaw, PL;
Tadeusz Chudoba, Warsaw, PL;
Elżbieta Pietrzykowska, Łochóow, PL;
Aleksandra Kędzierska, Kolonia Zawada, PL;
Dariusz Smoleń, Jasło, PL;
Wojciech Święszkowski, Warsaw, PL;
Krzysztof Kurzydłowski, Warsaw, PL;
INSTYTUT WYSOKICH CISNIEN POLSKIEJ AKADEMII NAUK, Warsaw, PL;
Abstract
To manufacture the implant a nanopowder of synthetic hydroxyapatite (Hap) is used having a hexagonal structure, average grain size in a range from 3 to 30 nm and the specific surface area greater than 200 m/g. First the nanopowder is formed to the desired geometric shape, and then the shape is fixed. In the step of shape information the dried nanopowder is pressed in the mold under the pressure ranging from 50 Mpa to 2 GPa. In the step of fixing the pressed nanopowder at room temperature is subjected to the pressure rising from the ambient value to the peak value selected from a range of 1 to 8 GPa and to a temperature selected from a range of 100° C. to 600° C. for a period of time selected from a range from 30 seconds to 5 minutes. The density of thus produced implant, determined by helium method, is not less than 75% of the theoretical density.