The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2017

Filed:

Jul. 17, 2012
Applicants:

Hirohiko Hasegawa, Niihama, JP;

Koichiro Watanabe, Niihama, JP;

Inventors:

Hirohiko Hasegawa, Niihama, JP;

Koichiro Watanabe, Niihama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 2/14 (2006.01); H01M 2/16 (2006.01); C08J 7/04 (2006.01);
U.S. Cl.
CPC ...
H01M 2/145 (2013.01); C08J 7/047 (2013.01); H01M 2/1653 (2013.01); H01M 2/1686 (2013.01); C08J 2323/02 (2013.01); C08J 2403/02 (2013.01); H01M 2/166 (2013.01);
Abstract

The present invention provides a method for producing a laminated porous film comprising a porous film substrate and a heat-resistant layer. The method comprises forming a heat-resistant layer mainly comprising a filler on the surface of the porous film substrate by applying a coating slurry comprising a solvent, a binder resin and the filler to the surface of the porous film substrate and then removing the solvent, wherein the coating slurry is prepared so as to have a contact angle of 75° or more with an untreated porous film substrate, and the method comprises conducting surface treatment of a porous film substrate so that the contact angle of the coating slurry with the porous film substrate can be 65° or less before applying the coating slurry to the surface of the porous film substrate.


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