The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2017

Filed:

Sep. 21, 2015
Applicant:

El-mul Technologies Ltd., Rehovot, IL;

Inventors:

Eli Cheifetz, Ramat Gan, IL;

Amir Weingarten, Ramat Gan, IL;

Semyon Shofman, Kiryat Ekron, IL;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/147 (2006.01); H01J 37/285 (2006.01); H01J 37/08 (2006.01); H01J 37/244 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/1472 (2013.01); H01J 37/08 (2013.01); H01J 37/244 (2013.01); H01J 37/285 (2013.01); H01J 37/317 (2013.01); H01J 2237/15 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/31749 (2013.01);
Abstract

An electron detection system for detecting secondary electrons emitted from a sample irradiated by a Focused Ion Beam (FIB). The FIB emanates from a FIB column and travels along a beam axis within a beam region, which extends from the FIB column to the sample. The system comprises an electron detector configured for detecting the secondary electrons, and a deflecting field configured to deflect a trajectory of the secondary electrons, which were propagating towards the FIB column, to propel away from the beam axis and towards the electron detector. The deflecting field may be configured to divert the trajectory of secondary electrons while the secondary electrons are generally within the beam region.


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