The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2017

Filed:

Mar. 31, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Sayuri Hada, Tokyo, JP;

Keiji Matsumoto, Kanagawa-ken, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06F 17/5068 (2013.01); G06F 17/5086 (2013.01);
Abstract

A method that minimizes adjustment of a wiring layer in reducing a warpage of a multilayered substrate and enables location of a part of a wiring layer that needs correction in order to reduce the warpage. The difference in average coefficient of thermal expansion, Δα, varies in a substrate. The method focuses in on the difference in Δα with a great length scale (low frequency) having a relatively significant effect on the warpage compared to the difference in Δα with a smaller length scale (high frequency) and corrects only the difference in Δα with a greater length scale. The distribution of the difference in Δα in a plane of substrate is determined. Then digital filtering is performed to extract only the difference in Δα with a low frequency and the difference in Δα between before and after correction, thereby revealing a part that requires correction.


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