The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2017
Filed:
Sep. 15, 2015
Applicant:
Sumitomo Chemical Company, Limited, Tokyo, JP;
Inventors:
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 220/22 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/004 (2006.01); G03F 7/32 (2006.01); G03F 7/039 (2006.01); C08F 14/18 (2006.01); G03F 7/032 (2006.01); C08F 224/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C08F 14/185 (2013.01); C08F 220/22 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); C08F 224/00 (2013.01); G03F 7/0325 (2013.01); G03F 7/2041 (2013.01);
Abstract
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.