The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2017
Filed:
Oct. 02, 2013
Applicant:
Cheil Industries Inc., Gumi-si, Gyeongsangbuk-do, KR;
Inventors:
Seung-Wook Shin, Suwon-si, KR;
Yun-Jun Kim, Suwon-si, KR;
Hea-Jung Kim, Suwon-si, KR;
Youn-Jin Cho, Suwon-si, KR;
Yoo-Jeong Choi, Suwon-si, KR;
Assignee:
Cheil Industries, Inc., Gumi-Si, Gyeongsangbuk-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 7/26 (2006.01); G03F 7/30 (2006.01); G03F 7/40 (2006.01); G03F 7/16 (2006.01); G03F 7/36 (2006.01); C07C 65/34 (2006.01); C07C 65/32 (2006.01); C07C 65/40 (2006.01); C07C 63/15 (2006.01); C07C 63/26 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C07C 63/15 (2013.01); C07C 63/26 (2013.01); C07C 65/32 (2013.01); C07C 65/34 (2013.01); C07C 65/40 (2013.01); G03F 1/00 (2013.01); G03F 7/09 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/26 (2013.01); G03F 7/30 (2013.01); G03F 7/36 (2013.01); G03F 7/40 (2013.01);
Abstract
Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same. In the above Chemical Formula 1, A, A', L, L′, X and n are the same as defined in the specification.
Shin, Seung-Wook. (2017). Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition (U.S. Patent No. 9671688). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9671688
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile