The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2017
Filed:
Feb. 20, 2013
Applicants:
Commissariat À L'énergie Atomique ET Aux Énergies Alternatives, Paris, FR;
Centre National DE LA Recherche Scientifique, Paris, FR;
Inventors:
Jérôme Neauport, Bordeaux, FR;
Eric Lavastre, Salles, FR;
Laurent Gallais, Pertuis, FR;
Nicolas Bonod, La Londe les Maures, FR;
Assignees:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); G02B 1/10 (2015.01); H01S 3/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1861 (2013.01); G02B 1/105 (2013.01); G02B 5/1866 (2013.01); G02B 5/1814 (2013.01); H01S 3/0057 (2013.01);
Abstract
The present invention relates to an optical device for reflective diffraction with high diffraction efficiency and high laser flux resistance. The device includes a protective structure having at least one mixture layer produced by a uniform mixture of a first material and of a second material, where both of these are dielectric, and wherein said first material has an optical index lower than that of the said second material.