The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2017
Filed:
Aug. 29, 2011
Hajime Tone, Osaka, JP;
Hideki Kawabata, Osaka, JP;
Hajime Tone, Osaka, JP;
Hideki Kawabata, Osaka, JP;
TOYOBO SPECIALTIES TRADING CO., LTD., Osaka, JP;
Abstract
Provided is a fabric that is favorably used for a side cloth of a down wear, a down jacket, a futon, a sleeping bag or some other, and that is light, thin and high in tear strength and can further keep a low air permeability after washed. The high-density fabric of the present invention that can attain the purpose is a fabric including a synthetic fiber that has a fineness of 28 dtex or less, and having a total cover factor ranging from 1700 to 2200. In this fabric, multifilaments are present in each of which monofilaments are arranged in the form of two layers in at least one direction of warp and weft directions. Furthermore, the fabric has a cover factor ranging from 700 to 900 in at least one direction of the warp and weft directions which has the multifilaments present.