The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2017

Filed:

Nov. 06, 2013
Applicant:

The University of Montana, Missoula, MT (US);

Inventors:

Edward Rosenberg, Missoula, MT (US);

Varadharajan Kailasam, Towanda, PA (US);

Daniel Nielsen, Burlington, VT (US);

Assignee:

The University of Montana, Missoula, MT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/42 (2006.01); B01J 20/22 (2006.01); B01J 49/00 (2006.01); C02F 1/28 (2006.01); B01J 20/32 (2006.01); B01J 20/34 (2006.01); C02F 101/10 (2006.01);
U.S. Cl.
CPC ...
C02F 1/42 (2013.01); B01J 20/3204 (2013.01); B01J 20/3236 (2013.01); B01J 20/3272 (2013.01); B01J 20/345 (2013.01); B01J 20/3433 (2013.01); C02F 1/285 (2013.01); C02F 2101/103 (2013.01);
Abstract

Silica polyamine composites (SPC) made from silanized amorphous nano-porous silica gel and poly(allylamine) (BP-1) were functionalized with phosphorus acid using the Mannich reaction, resulting in a phosphonic acid modified composite (BPAP). Zirconium (IV) was immobilized on BPAP. Arsenate anions strongly adsorbed on the ZrBPAP composite in the pH range 2 to 8, while arsenite only adsorbed well at pH 10. Regeneration of the resin was carried out successfully for As(V) and As(III) using 2M-HSO. Four adsorption/desorption cycles were performed for As(V) at pH 4 without significant decrease in the uptake performance. ZrBPAP capture capacity and kinetics for arsenate were tested for longevity over 1000 cycles with only a marginal loss of performance.


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