The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2017
Filed:
Sep. 09, 2016
Seiko Epson Corporation, Tokyo, JP;
So Yokota, Shiojiri, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A first pattern and second patterns, having a plurality of sub-patterns, are formed while an ejector is moved in a forward direction, and a third pattern and fourth patterns are formed while the ejector is moved in a backward direction. The third pattern has sub-patterns deviating in sequence from the respective sub-patterns of the first pattern in the first directions by a first deviation amount. The fourth patterns each have sub-patterns deviating in sequence from the respective sub-patterns of the second patterns in the first directions by a second deviation amount. The positions of sub-patterns of a rough adjustment pattern, including the first and the third pattern, and the positions of sub-patterns of fine adjustment patterns, including the second and the fourth patterns, are associated with each other. In each fine adjustment pattern, image density periodically changes along the first directions and one or more cycles of periodic changes are included.