The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Aug. 19, 2015
Applicants:

Lg Display Co., Ltd., Seoul, KR;

Inha Industry Partnership Institute, Incheon, KR;

Inventors:

Jinkyun Lee, Incheon, KR;

Youngmi Kim, Incheon, KR;

Jonggeun Yoon, Gunpo-si, KR;

Joonyoung Heo, Seoul, KR;

Euidoo Do, Goyang-si, KR;

Yeonkyeong Lee, Seoul, KR;

Soohyun Kim, Incheon, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); H01L 51/56 (2006.01); H01L 27/32 (2006.01); C08F 20/24 (2006.01); H01L 51/00 (2006.01); C08F 20/10 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0018 (2013.01); C08F 20/10 (2013.01); C08F 20/24 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0384 (2013.01); H01L 27/3283 (2013.01); H01L 51/56 (2013.01); H01L 51/0043 (2013.01);
Abstract

A highly fluorinated photoresist employing a photodimerization chemistry and a method for manufacturing an organic light emitting diode display using the same. The photoresist includes a copolymer that is made from two different monomers. When the copolymer is used as a photoresist, the photoresist has the characteristic that it becomes insoluble when exposed to an ultraviolet light having a wavelength of 365 nm.


Find Patent Forward Citations

Loading…