The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2017
Filed:
Aug. 08, 2016
Globalfoundries Inc., Grand Cayman, KY;
Wai-Kin Li, Hopewell Junction, NY (US);
Chengwen Pei, Danbury, CT (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
Devices and methods are provided for constructing a semiconductor structure that implements a PUF (physical unclonable function) based on a FinFET structure. The PUF is based on a random pattern of merged and non-merged source and drain structures, which are formed on adjacent semiconductor fin structures of adjacent pairs of FinFET devices, as a result of process-induced variations in the epitaxial growth of source and drain structures on the semiconductor fin structures. The random pattern of merged and non-merged source and drain structures provides a random pattern of electrical open and short connections between pairs of semiconductor fin structures, wherein the random pattern of electrical open and short connections defines the physical unclonable function.