The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Mar. 29, 2012
Applicants:

Akihisa Inoue, Sendai, JP;

Nobuyuki Nishiyama, Sendai, JP;

Haruko Yamazaki, Sendai, JP;

Inventors:

Akihisa Inoue, Sendai, JP;

Nobuyuki Nishiyama, Sendai, JP;

Haruko Yamazaki, Sendai, JP;

Assignee:

TOHOKU UNIVERSITY, Sendai, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01B 1/02 (2006.01); C22F 1/08 (2006.01); C22C 9/00 (2006.01); H01H 1/025 (2006.01);
U.S. Cl.
CPC ...
H01B 1/026 (2013.01); C22C 9/00 (2013.01); C22F 1/08 (2013.01); H01H 1/025 (2013.01);
Abstract

Disclosed is a beryllium-free copper alloy having high strength, high electric conductivity and good bending workability and a method of manufacturing the copper alloy. Provided is a copper alloy having a composition represented by the composition formula by atom %: Cu100-a-b-c(Zr, Hf)a(Cr, Ni, Mn, Ta)b(Ti, Al)c [wherein 2.5≦a≦4.0, 0.1<b≦1.5 and 0≦c≦0.2; (Zr, Hf) means one or both of Zr and Hf; (Cr, Ni, Mn, Ta) means one or more of Cr, Ni, Mn and Ta; and (Ti, Al) means one or both of Ti and Al], and having Cu primary phases in which the mean secondary dendrite arm spacing is 2 μm or less and eutectic matrices in which the lamellar spacing between a metastable Cu5(Zr, Hf) compound phase and a Cu phase is 0.2 μm or less.


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