The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2017
Filed:
Feb. 02, 2011
Applicants:
Noboru Iwata, Osaka, JP;
Teruhisa Kotani, Osaka, JP;
Tazuko Kitazawa, Osaka, JP;
Yoshiteru Murakami, Osaka, JP;
Inventors:
Noboru Iwata, Osaka, JP;
Teruhisa Kotani, Osaka, JP;
Tazuko Kitazawa, Osaka, JP;
Yoshiteru Murakami, Osaka, JP;
Assignee:
SHARP KABUSHIKI KAISHA, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/10 (2015.01); G02B 1/118 (2015.01);
U.S. Cl.
CPC ...
G02B 1/118 (2013.01);
Abstract
An antireflective structure having a higher antireflective effect compared with those of conventional antireflective structures is produced by a simple process. The antireflective structure () includes a plurality of concavities () each having a plurality of convexities () thereon, and a pitch between the plurality of convexities () and a pitch between the plurality of concavities () are smaller than a wavelength of light incident to the antireflective structure ().