The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2017
Filed:
Jan. 29, 2014
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
The Trustees of the University of Pennsylvania, Philadelphia, PA (US);
Jin Young Hwang, Gyeonggi-do, KR;
Joon Soo Kim, Seoul, KR;
Jae Moon Jo, Gyeonggi-do, KR;
Yang Lim Choi, Gyeonggi-do, KR;
Jongho Lee, Ulsan, KR;
Samsung Electronics Co., Ltd., Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;
The Trustees Of The University Of Pennsylvania, Philadelphia, PA (US);
Abstract
An MRI system acquires a susceptibility-weighted image by acquiring a first RF echo signal in a first echo time for providing an image exclusive of susceptibility-weighting and acquiring a second RF echo signal in a second echo time longer than the first echo time for providing an image including susceptibility-weighting. A compensation gradient field is applied for compensating for field inhomogeneity and in response, a third RF echo signal is acquired in a third echo time longer than the second echo time. First, second and third images are generated in response to data derived from the first, second and third RF echo signals respectively and data of the first, second and third images is combined to provide image data representing an image compensating for magnetic resonance signal attenuation in the second image.