The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Dec. 17, 2014
Applicant:

Schlumberger Technology Corporation, Sugar Land, TX (US);

Inventors:

Adriaan Gisolf, Houston, TX (US);

Youxiang Zuo, Burnaby, CA;

Ronald E. G. van Hal, Belmont, MA (US);

Jeffrey Crank, Walpole, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/28 (2006.01); E21B 49/08 (2006.01); E21B 49/10 (2006.01); G01N 30/88 (2006.01);
U.S. Cl.
CPC ...
G01N 33/2823 (2013.01); E21B 49/087 (2013.01); E21B 49/10 (2013.01); G01N 30/88 (2013.01); G01N 33/28 (2013.01); E21B 2049/085 (2013.01); G01N 2030/8854 (2013.01);
Abstract

Methods are provided for reservoir analysis. In some embodiments, a reservoir may be analyzed by obtaining abundance ratios at a first measurement station and a second measurement station and determining an abundance ratio trend. Abundance ratios at a third measurement station may be obtained and plotted versus depth with the previously obtained abundance ratios. A change in the abundance ratio trend may be identified and result in further investigation of the reservoir. If the abundance ratio is unchanged, additional abundance ratios may be obtained and plotted versus depth to further evaluate the abundance ratio trend. Methods for reservoir analysis using fluid predictions with and without offset well information are also provided.


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