The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2017
Filed:
Aug. 20, 2014
Applicant:
Advanced Polymer Monitoring Technologies, Inc., New Orleans, LA (US);
Inventors:
Wayne Frederick Reed, New Orleans, LA (US);
Michael Felix Drenski, New Orleans, LA (US);
Alex Wayne Reed, New Orleans, LA (US);
Assignees:
ADVANCED POLYMER MONITORING TECHNOLOGIES, INC., New Orleans, LA (US);
THE ADMINISTRATORS OF THE TULANE EDUCATIONAL FUND, New Orleans, LA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/02 (2006.01); G01N 21/51 (2006.01); G01N 21/75 (2006.01); G01N 33/68 (2006.01); G01N 21/53 (2006.01); G01N 21/47 (2006.01);
U.S. Cl.
CPC ...
G01N 15/0211 (2013.01); G01N 21/51 (2013.01); G01N 21/53 (2013.01); G01N 33/6803 (2013.01); G01N 2021/4711 (2013.01); G01N 2021/4719 (2013.01); G01N 2021/4726 (2013.01); G01N 2021/4792 (2013.01); G01N 2201/0612 (2013.01); G01N 2201/08 (2013.01); G01N 2201/1224 (2013.01);
Abstract
Simultaneous Multiple Sample Light Scattering systems and methods can be used for polymer stability testing and for applying stressors to polymer or colloid solutions including heat stress, ultrasound, freeze/thaw cycles, shear stress and exposure to different substances and surfaces, among others, that create a polymer stress response used to characterize the polymer solution and stability.