The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Mar. 04, 2015
Applicants:

James E. Barefield, Ii, Los Alamos, NM (US);

Elizabeth J. Judge, Los Alamos, NM (US);

Loan A. Le, Los Alamos, NM (US);

Leon N. Lopez, Santa Cruz, NM (US);

Andrew C. Beveridge, Los Alamos, NM (US);

Daniel R. Chapman, Oakland, CA (US);

Seth T. Taylor, Fullerton, CA (US);

Inventors:

James E. Barefield, II, Los Alamos, NM (US);

Elizabeth J. Judge, Los Alamos, NM (US);

Loan A. Le, Los Alamos, NM (US);

Leon N. Lopez, Santa Cruz, NM (US);

Andrew C. Beveridge, Los Alamos, NM (US);

Daniel R. Chapman, Oakland, CA (US);

Seth T. Taylor, Fullerton, CA (US);

Assignees:

CHEVRON U.S.A. INC., San Ramon, CA (US);

LOS ALAMOS NATIONAL SECURITY, LLC, Los Alamos, NM (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/30 (2006.01); F16B 2/08 (2006.01); G01N 21/71 (2006.01); G01N 21/27 (2006.01); G01N 21/90 (2006.01);
U.S. Cl.
CPC ...
F16B 2/08 (2013.01); G01N 21/718 (2013.01); G01N 21/274 (2013.01); G01N 21/909 (2013.01); G01N 2201/0221 (2013.01);
Abstract

A method for evaluating a vessel for suitability to contain a fluid includes providing a vessel and forming a polished surface portion of the vessel by removing oxidation and/or contaminants from a portion of the vessel. The method further includes applying a focused laser to the polished surface portion to form plasma on the polished surface portion, and determining whether the vessel is suitable for containing a fluid based on silicon content of the polished surface portion. The silicon content is estimated based on light emitted from the plasma.


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